To find out the effective slurry with suitable type of oxidizer and concentration , chemical etching experiment was applied to the litao3 wafer . the chemical etching effects were analysed by measuring etching rate and x - ray spectrum 采用化學(xué)腐蝕實(shí)驗(yàn)方法研究拋光液中氧化劑種類和濃度以及拋光液ph值對(duì)鉭酸鋰晶片化學(xué)去除的影響。